catalytic chemical vapor deposition

常見例句

雙語例句

• Polysilicon thin films are deposited by catalytic chemical vapor deposition method. The substrate temperature is 300 ℃ and catalytic hot wire is tungsten filament.
  以金屬鎢為催化熱絲，采用熱絲催化化學(xué)氣相沉積，在300℃的玻璃襯底上沉積多晶硅薄膜。
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