cluster ion

基本解釋

Changes in surface roughness after gas cluster ion bombardments have been measured by an atomic force microscope.
用原子力顯微鏡測量了氣體離化團束照射后表面粗糙度的變化。
The higher sputtering yield would result from multiple collision, lateral sputtering and high density energy deposition of gas cluster ion beam.
氣體離化團束的高濺射產(chǎn)額可能是由于多體碰撞、側(cè)向濺射及高能量密度的照射引起的。
The unique smoothing and cleaning effects of gas cluster ion beam wou1d result from multiple collision, lateral sputtering and high density energy deposition.
氣體離化團束優(yōu)良的平坦化和清潔化效果可能與照射中多體碰撞、側(cè)向濺射及高能量密度的沉積相關。