glow discharge process

基本解釋

The principle, discharge mode and alloying process of double glow discharge plasma surface alloying process were introduced particularly.
詳細(xì)介紹了雙層輝光離子滲金屬技術(shù)的基本原理、放電模式及滲金屬過程。
There are three important parameters in the DC glow discharge process, the discharge current, discharge voltage and argon pressure in discharge source.
直流輝光放電過程中需要控制的三個(gè)重要工作參數(shù)為放電電流、放電電壓和放電室內(nèi)氬氣氣壓。
The relation between characteristics of hot cathode glow discharge and diamond film deposition techniques in hot cathode glow discharge plasma chemical vapor deposition process was discussed.
研究了在熱陰極輝光放電等離子體化學(xué)氣相沉積金剛石膜過程中，熱陰極輝光放電特性與金剛石膜沉積工藝的關(guān)系。