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Laser lithography is one of the main methods for manufacturing micro-optical and the binary optical masks. 激光光刻是加工微光學(xué)及二元光學(xué)掩模的主要手段。
To improve the fabrication technology of photoelectrical encoder, the laser lithography method was introduced. 為了改進(jìn)光電碼盤的制作工藝，提高效率，降低成本，提出了一種光電碼盤的光刻方法。
The smallest linewidth produced by laser lithography plays an important role in the properties of the micro-optical elements. 光刻的最細(xì)線寬對(duì)所加工的二元微器件性能起決定作用。