low pressure chemical vapor deposition

基本解釋

The traditional ways to obtain polycrystalline film include solid phase crystallization (SPC), low pressure chemical vapor deposition (LPCVD) and excimer laser annealing (ELA).
目前常用的幾種獲得多晶薄膜的方法包括：低壓化學(xué)氣相沉積、固相結(jié)晶、準(zhǔn)分子激光晶化等。
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Ultra-high Vacuum Chemical Vapor Deposition (UHVCVD) was a good choice, it provided a super clean, low temperature, low pressure ambient, and controlled thin films' growth precisely.
超高真空化學(xué)氣相沉積（UHVCVD）具有超凈的生長(zhǎng)環(huán)境、能夠在低溫、低壓下生長(zhǎng)鍺硅材料，可精確控制薄膜生長(zhǎng)等優(yōu)點(diǎn)。
Diamond thin films were successfully deposited on single - crystal Si substrate at low pressure by a homemade equipment of electron cyclotron resonance chemical vapor deposition (ECRCVD) .
采用國內(nèi)研制的電子回旋共振化學(xué)氣相沉積（ECRCVD）設(shè)備，在單晶硅襯底上沉積了金剛石薄膜。