lpcvd

常見例句

• Deposition of Carbon Nanotubes Film by LPCVD and Related Field Emission Property[J].
  引用該論文 陳婷;孫卓;郭平生;王莉莉;黃素梅.
• R. A. Levy, M. L. Green and P. K. Gallager, “Characterization of LPCVD Aluminum for VLSI process,” J. Electrochem. Soc., 1984, p.2175.
  楊正杰，張鼎張，鄭晃忠，“銅金屬與低介電常數(shù)材料與制程”，毫微米通訊，第七捲，第四期，2000
• This result offers a convenient and effective solution for improving thickness variation in LPCVD furnace oxide deposition processes.
  這一結(jié)果為低壓化學(xué)汽相沉積得到的隧穿氧化薄膜的平坦化提供了新思路。
• This paper introduced the preparation technologies and properties of CVD for Si_3N_4 films and the process of low pressure chemical vapor deposition(LPCVD).
  簡要介紹了Si3N4膜的制備方法及CVD法制備的Si3N4薄膜的特性;詳細(xì)介紹了低壓化學(xué)氣相淀積(LPCVD)氮化硅的工藝.
• Si Quantum dots(Ti doped) have been formed by self-assembled growth on SiO_2 surfaces using the low pressure chemical vapor deposition(LPCVD) with two step annealing.
  通過自組裝生長并結(jié)合兩步退火處理,在SiO2表面得到了Ti摻雜的Si納米晶粒量子點。
• We investigate a new method to improve the Si3N4 uniformity within wafers located in two ends of boat in a low pressure chemical vapor deposition (LPCVD) system.
  本文提出了一種改善半導(dǎo)體制造低壓化學(xué)氣相淀積(LPCVD)工藝中BOAT兩端膜厚片內(nèi)均一性的新方法。
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