nanoimprint lithography

常見例句

Nanoimprint lithography becomes a hot focus of novel lithography technologies of next generation due to its advantages of low cost, high yield and fidelity of large area pattern transfer.
納米壓印光刻技術具有效率高、失真率低、易于實現(xiàn)大面積圖形轉移等特點，成為下一代光刻技術的研究熱點。
For the removal of residual layer after template is released during nanoimprint lithography, a new UV-nanoimprint technology without residual layer based on photolithography mask was proposed.
針對納米壓印光刻技術中壓印脫模后的留膜去除問題，提出了一種基于光刻版的無留膜紫外納米壓印技術。
Nanoimprint, as a non-optical lithography technology , has demonstrated its ability for semiconductor manufacturing by offering resolution below sub-10nm feature size, high throughput and low cost.
納米壓印作為非光學的下一代光刻技術，具有分辨率高、成本低、產(chǎn)率高等諸多優(yōu)點，因而可能應用于將來的半導體制造中。