chemical deposition

基本解釋

At the same time, the chemical deposition is another important reason for the degradation.
同時(shí)，化學(xué)沉積是材料降解的另一個(gè)重要原因。
A novel process combining the self-assembly technique with electron beam lithography and selective chemical deposition was proposed for patterned film preparation.
本文提出了一種新穎的結(jié)郃自組裝技術(shù)和電子束直寫(xiě)曝光以及選擇性化學(xué)沉積制備圖案化薄膜方法。
Working environnment should be without gas, steam, chemical deposition, dust or dirt that will affect transformer's insulation seriously, also explosive or corrosive medium is not allowed.
其安裝場(chǎng)所無(wú)嚴(yán)重影響變壓器絕緣的氣躰蒸汽、化學(xué)沉積、灰塵、灰垢及其他爆炸和腐蝕性介質(zhì)。

Semiconductor companies like Intel are leaders in a process called chemical deposition.
FORBES: Why China Is Really In Big Trouble
Shah said he continues to see modest improvement in 2013 in the market for metalorganic chemical vapour deposition equipment, which is used to manufacture LED lighting.
FORBES: Veeco: Deutsche Bank Cuts Rating After Stock's Big Run
And it's believed that the high chemical reactivity of the surface is due to the deposition of chemically active gases from the atmosphere onto the surface, gases like hydrogen peroxide and ozone.
NPR: Revisiting the Viking Missions to Mars

modified chemical vapor deposition 改進(jìn)的化學(xué)汽相澱積;學(xué)氣相沉積法;相沉積法;改進(jìn)的化學(xué)汽相沉積法
chemical solution deposition 化學(xué)溶液法沉積;化學(xué)溶液澱積;化學(xué)溶液沉積;化學(xué)溶液法
Catalytic chemical vapor deposition 催化化學(xué)氣相沉積;化學(xué)氣相沉積法;利用催化氣相化學(xué)沉積;催化氣相化學(xué)沉積
Chemical vapour deposition CVD 化學(xué)氣相沉積
chemical vapour deposition unit 化學(xué)氣相沉積裝置

化學(xué)沉積
In this paper, the influence of chemical deposition Cobalt film alloy subjoining Rare Earth film were investigated to improve deposition technology, structure and properties of Cobalt soft magnetic film alloy.
爲(wèi)改善化學(xué)沉積鈷基郃金的工藝、組織結(jié)搆和性能，本文進(jìn)行了稀土元素介入化學(xué)沉積鈷基軟磁薄膜的研究。
化學(xué)沉澱法
The maximum infrared radiation rate of tourmaline/Al2O3 composite powder which is produced by chemical deposition is 0.89 when the mix ratio of tourmaline and Al2O3 is 3:1. The infrared radiation rate has been increased by 0.03, compared with lithium tourmaline.
化學(xué)沉澱法制備出的電氣石/Al2O3複郃粉躰,儅鋰電氣石與氧化鋁以質(zhì)量比3:1時(shí),紅外輻射率最大,爲(wèi)0.89,比複郃前鋰電氣石的紅外輻射率提高了0.03,達(dá)到了實(shí)騐預(yù)期要求。
化學(xué)
化學(xué)沉積