etch rate uniformity
基本解釋
- [電子、通信與自動(dòng)控制技術(shù)]刻蝕速率均勻性
英漢例句
- It is proved that the uniformity of etch rate can be improved and the effect of micro load can be decreased by adjusting the value of chamber pressure, gas flow rate and RF power properly.
結(jié)果表明,通過(guò)對(duì)反應(yīng)室壓力、刻蝕氣躰流量和射頻功率的調(diào)節(jié),可以降低微負(fù)載傚應(yīng)的影響,得到良好的刻蝕均勻性。
雙語(yǔ)例句
專業(yè)釋義
- 刻蝕速率均勻性