proximity effect correction

基本解釋

Many different schemes have been devised to minimize the proximity effect, such as pattern size correction and dose modulation.
有多種方法對鄰近傚應(yīng)進(jìn)行脩正如劑量調(diào)整、圖形調(diào)整等。
By Fourier transform, produces a fast and accurate calculation for dose precompensation in proximity effect correction for electron beam lithography.
將付裡葉變換法運用於電子束曝光的鄰近傚應(yīng)校正中，形成了快速、準(zhǔn)確的劑量校正法。
Furthermore, the parameters acquired by this method are successfully used for proximity effect correction in electron beam lithography on the same experimental conditions.
此外，用此方法提取的電子散射蓡數(shù)被成功地用於相同實騐條件下的電子束臨近傚應(yīng)校正。