ion beam sputtering

基本解釋

• 離子束濺射；離子束濺鍍法

英漢例句

雙語例句

• WO_3 thin films prepared by Reactive Ion Beam Sputtering are amorphous at RT substrate temperature.
  本文利用反應(yīng)離子束濺射技術(shù)制備WO_3薄膜，在襯底溫度為室溫時，濺射制備的薄膜經(jīng)電子束（?）
• Ion beam sputtering deposited Ni was used as etching mask. The measured etching rates increased with the increasing ICP dc bias.
  采用離子束濺射生長的N i作為刻蝕掩模，刻蝕速率隨ICP直流偏壓的增加而增加。
• The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
  濺射特性研究結(jié)果表明：屏極電壓和濺射氣壓對離子束均勻性和束流密度影響顯著；

• ion beam sputtering更多例句

詞組短語

短語

• ion n beam sputtering 離子束濺射
• reactive ion -beam sputtering 反應(yīng)離子束濺射
• ion -beam sputtering technique 離子束濺射技術(shù)
• ion beam sputtering system 離子束濺鍍系統(tǒng);離子束微影術(shù)
• ion beam sputtering method 離子束濺射法

• ion beam sputtering更多詞組

專業(yè)釋義

機(jī)械工程

• 離子束沉積
• 離子束濺射

物理學(xué)

• 離子束濺射