ion beam sputtering

常見例句

雙語例句

• WO_3 thin films prepared by Reactive Ion Beam Sputtering are amorphous at RT substrate temperature.
  本文利用反應(yīng)離子束濺射技術(shù)制備WO_3薄膜，在襯底溫度為室溫時(shí)，濺射制備的薄膜經(jīng)電子束（?）
• Ion beam sputtering deposited Ni was used as etching mask. The measured etching rates increased with the increasing ICP dc bias.
  采用離子束濺射生長(zhǎng)的N i作為刻蝕掩模，刻蝕速率隨ICP直流偏壓的增加而增加。
• The results about the research on the characters of ion beam sputtering show that grid voltage and sputtering gas pressure have great influences on ion beam distribution and current.
  濺射特性研究結(jié)果表明：屏極電壓和濺射氣壓對(duì)離子束均勻性和束流密度影響顯著；
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